- Sample preparation
- Magnetron sputtering
- Ion-beam sputtering
- Pulsed laser deposition
- Electron-beam lithography
- Structural and chemical characterization
- SEM – Scanning Electron Microscopy
- XRR – X-ray Reflectometry
- XRD – X-ray Diffraction
- LEED, RHED (Low Energy Electron Diffraction, High Energy Electron Diffraction)
- XRF – X-ray Fluorescence
- XPS and AES spectroscopy
- Profilometer (measurements of thin films thickness)
- Static magnetic measurements
- VSM – Vibrating Sample Magnetometer
- GMR – Giant Magneto Resistance
- P-MOKE Magnetometer
- P-MOKE Microscopy
- Dynamic magnetic measurements
- VNA-FMR – Vector Network Analyzer – Ferromagnetic Resonance
- FMR – Ferromagnetic Resonance
- PIMM – Pulsed Inductive Microwave Magnetometer
- High vacuum and electrochemical equipment for hydrogen absorption/desorption with optical or electrical monitoring
- Infrastructure - presentation
The UHV laboratory is equipped with a set of chambers with a mean base pressure of 5x10-9 mbar (PREVAC). The system enables to prepare ultrathin layers and nanostructures by PVD (EBV evaporation and thermal evaporation), and further surface analysis: structural – LEED, RHEED; electronic with the use of home-made SPM; compositional- X-ray photocpectroscopy (XPS- VG Scienta).
